Tantalum Sputtering Target 99.99%

Item Name

High purity tantalum (Ta) target

Purity

99.95, 99.99%

Shape

Flat/rotary target, according to your request

Available size

Round: dia 25~550mm,Thickness:3~30mm

Rectangular: Length up to 2000mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Hot Isostatic Pressing (HIP), Powder metallurgy, Patentedthermo-mechanical process

Application

Widely used in coating processing industries

A: Magnetic Data Storage Application

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.

 Advantages

Microstructure: Uniform equiaxed fine grain, consistentmicrostructure, average grain size <100μm

Detailed information

Tantalum can be used to make evaporation containers, tubeelectrodes, rectifier, electrolysis, capacitance and mend destroyedtissue by sheet or fine wire tantalum in medical treatment.

Tantalum is also the production material of electronictubes, high-power electron tube parts. Tantalum corrosion-resistantequipment is used for the production of strong acid, bromine,ammonia and other chemical industry. metal tantalum can be used forstructural materials for aircraft engine combustion chamber.Tantalum tungsten alloy, tantalum tungsten hafnium alloy andtantalum hafnium alloy can be used as heat-resistant high-strengthmaterials for rockets, missiles and jet engines, as well as controland regulating equipment parts etc.

 QualityStandard (99.99%Ta)

Element

Value(≤Ppm)

Element

Value(≤Ppm)

Element

Value(≤Ppm)

Nb

3

Ni

0.5

Ti

0. 5

O

10

Zr

1

Mn

0. 5

N

3

Cr

0. 5

Al

0. 5

C

5

W

1

H

2

Si

0. 5

Mo

1

Fe

2

Cu

0. 5